High Pure Ge Target 5 Characteristics and 4 Applications

Table of Contents

Introduction

High pure Ge target is characterized by high density, high thermal conductivity, high melting point, high electrical conductivity and high stability.

It is a sputtering target made of high purity germanium metal processed by a special process. The target has a grayish-white appearance and exhibits hard and brittle qualities, whose high purity ensures that the target provides a stable and pure supply of germanium atoms during the sputtering process, thus ensuring the quality and performance of the final product.

Characteristics of Ge Target

High Density

The density of germanium is as high as 5.35g/cc. During the thin film deposition process, the high purity Ge target is able to provide sufficient germanium atoms, resulting in a significant improvement in the quality and performance of the film.

Excellent Thermal Conductivity

Ge target is able to transfer heat quickly and uniformly, which not only improves the efficiency of film deposition, but also ensures film uniformity and stability.

Ge Target

High Melting Point

The melting point of germanium is as high as 937°C, enabling high-purity germanium targets to withstand high temperatures and maintain stable physical and chemical properties during thin film deposition.

High Conductivity

As a semiconductor material, high-purity Ge target has good electrical conductivity, which makes the germanium film formed by its deposition have excellent electrical properties.

High Stability

High pure Ge target also has strong antioxidant ability, can be in the high temperature and oxygen environment to maintain stability, not easy to be oxidized.

Application of Ge Target

Optical Field

Commonly used in the preparation of coatings with specific optical properties, such as anti-reflective coatings and reflector coatings.

Infrared Optical Field

Widely used in the manufacture of infrared windows, lenses and mirrors for infrared technology.

Solar Cell Field

By utilizing solar cells prepared from high-purity Ge targets, the photoelectric conversion efficiency can be effectively improved, reducing energy consumption and contributing to the development of renewable energy.

Semiconductor Field

Used for manufacturing semiconductor devices such as diodes, transistors, etc.

Conclusion

This article describes five characteristics and four applications of Ge target that our company can produce N-Type 99.999% pure germanium target with range of 50mm-2000mm in size, 1-20mm in thickness for each set.

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